CA-MX4R Metallurgical Microscope

Overview

The CA-MX4R metallurgical microscope is intended for industrial inspection of wafers and flat-panel displays. A large-travel specimen stage accommodates inspection across the sample, while long-working-distance metallurgical objectives provide the documented optical configuration. Available observation modes include reflected brightfield, oblique illumination, polarization and differential interference contrast. These modes are configuration choices and should be confirmed with the required optical accessories. Review the specification image below when defining the specimen requirements and observation method.

• Large-travel specimen stage.
• Long-working-distance metallurgical objectives.
• Reflected brightfield and oblique illumination configurations.
• Polarization and differential interference contrast options.

For a dedicated wafer inspection platform, explore the CA-AWL046-068 wafer inspection system.